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Laser Optics Manufacturing: Metrology

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METROLOGY

If you can’t measure it, you can’t make it

Edmund Optics® uses a wide variety of state-of-the-art metrology technologies to ensure that all specifications are met. Our in-process metrology capabilities include cavity ring-down spectroscopy, white light interferometry, non-contact 3D profilometry, and much more. An in-house laser testing lab allows for internal process improvement and verification of laser damage threshold.

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Technologies

 

KEY TECHNOLOGY

Short Coherence Length Interferometry

  Special LED source used to measure parallel, flat surfaces while minimizing reflections off back surfaces

  Eliminates the need for special treatment of the rear surface, which minimizes measurement time, the risk of damage to the part, and the risk of inaccurate measurements

  Ideal for measuring dual-side-coated optics such as IBS coated mirrors with stress-compensating coatings on the backside

 

KEY TECHNOLOGY

Photothermal Common-Path Interferometry

  Accurately measure absorption for better characterization of the spectral properties of optical coatings and substrates

  A pump-probe geometry measures change in refractive index due to absorption-induced thermal expansion

  More sensitive and accurate absorption measurement for very low levels of absorption than spectrophotometers, which determine absorption indirectly by directly measuring transmission

 
 

KEY TECHNOLOGY

Laser Optics Assembly Metrology

  In-house testing to measure assembly performance

  Transmitted wavefront error

  Laser beam profiling

  Measuring power in bucket and energy on target

  Development of application-specific tests

 

KEY TECHNOLOGY

Ultraviolet (UV) Degradation

  In-house laser lab performing long-run applied UV laser exposure experiments at 355nm with a 10ns pulse duration

  Laser-induced contamination is a key concern for UV laser systems

  Contamination resulting from the environment or outgassing can significantly reduce performance or lead to system failure

  Intimate knowledge of cleaning and assembly techniques to mitigate these effects

 
Laser Rod Testing

Laser Rod Testing

  • TRIOPTICS Laser Rod Test Station used to measure the wedge, or surface tilt, and transmitted wavefront error of both flat and curved laser rods
  • Wedge measurement accuracy of 1.3 arcsec, resolution of 0.05 arcsec, and repeatability of 0.12 arcsec
  • Wavefront accuracy of <1/20 (RMS) λ and dynamic range of >2000 λ for wavelengths from 405-1100nm
Spectrophotometry

Spectrophotometry

  • Used to characterize reflective and transmissive spectral performance
  • Large spectral measurement range of 120nm – 20μm
  • Measures greater than OD 7 blocking for an accurate representation of transmission and rejection bands
Interferometry

Interferometry

  • Transmitted and reflected wavefront measurements down to < λ/20
  • Stitching, large and small aperture, and computer-generated hologram setups
  • Used to qualify surface irregularity of flats, spherical and aspherical components, and optical assemblies
Laser Damage Threshold (LDT) Testing

Laser Damage Threshold (LDT) Testing

  • Components tested both in-house and outsourced for guaranteed LDT
  • Internal high-power nanosecond Nd:YAG laser at 1064nm and harmonics (532nm and 355nm)
  • Other wavelengths and pulse durations available
  • Test data available upon request
Cavity Ring-Down Spectroscopy

Cavity Ring-Down Spectroscopy

  • High-accuracy loss measurement with sensitivity in the parts per million
  • Tuned for common Nd:YAG harmonics - other wavelengths available upon request
  • Accurately quantifies both high and low reflectivity laser optics
Atomic Force Microscopy (AFM)

Atomic Force Microscopy (AFM)

  • High-accuracy characterizations of surface roughness and feature sizes and locations
  • Lateral resolution down to 3nm
  • Vertical resolution down to 0.1nm
Differential Interference Contrast (DIC) Microscopy

Differential Interference Contrast (DIC) Microscopy

  • High-sensitivity defect detection in transmissive materials
  • Used for analyzing laser damage in optical coatings and substrates
  • Surfaces analyzed under 100X magnification
Ultrafast Dispersion Characterization

Ultrafast Dispersion Characterization

  • Accurately measure group delay dispersion (GDD) of multilayer ultrafast optics
  • Ultra-broadband spectral coverage ranging from 250nm to 2100nm
  • GDD accuracy of ±5 fs2 at AOI between 0-70°
Non-Contact 3D Profilometry

Non-Contact 3D Profilometry

  • Verify surface profile of precision aspheric lenses
  • OptiPro UltraSurf 4X 100 Non-Contact
  • Measure surfaces without scratching or damaging the parts
 

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* The term dual use is often used to describe the types of items subject to the EAR (Export Administration Regulations). A dual use item is one that has civil applications as well as military or weapons of mass destruction (WMD)-related applications.

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